DocumentCode :
1060383
Title :
Stochastic Power/Ground Supply Voltage Prediction and Optimization Via Analytical Placement
Author :
Kahng, Andrew B. ; Liu, Bao ; Wang, Qinke
Author_Institution :
California Univ., San Diego
Volume :
15
Issue :
8
fYear :
2007
Firstpage :
904
Lastpage :
912
Abstract :
Increasingly significant power/ground (P/G) supply voltage degradation in nanometer VLSI designs leads to system performance degradation and even malfunction, which requires stochastic analysis and optimization techniques. We represent the supply voltage degradation at a P/G node as a function of the supply currents and the effective resistance of a P/G supply network and propose an efficient stochastic system-level P/G supply voltage prediction method, which computes P/G supply network effective resistances in a random walk process. We further propose to reduce P/G supply voltage degradation via placement of supply current sources, and integrate P/G supply voltage degradation reduction with conventional placement objectives in an analytical placement framework. Our experimental results show that the proposed stochastic P/G supply network prediction method achieves 10x-100x speedup compared with traditional SPICE simulation, and the proposed P/G supply voltage degradation aware placement achieves an average of 20.9% (11.7%) reduction on maximum (average) supply voltage degradation with only 4.3% wirelength increase.
Keywords :
SPICE; VLSI; circuit layout CAD; integrated circuit design; optimisation; stochastic processes; SPICE simulation; analytical placement; nanometer VLSI design; optimization; power/ground supply voltage; stochastic analysis; supply voltage degradation; system performance degradation; Current supplies; Degradation; Performance analysis; Power supplies; Prediction methods; Stochastic processes; Stochastic systems; System performance; Very large scale integration; Voltage; Analytical placement; VLSI design; infrared (IR) drop analysis; power/ground (P/G) distribution;
fLanguage :
English
Journal_Title :
Very Large Scale Integration (VLSI) Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
1063-8210
Type :
jour
DOI :
10.1109/TVLSI.2007.900745
Filename :
4276780
Link To Document :
بازگشت