Title :
Fabrication and characterization of a micromachined acoustic sensor with integrated optical readout
Author :
Lee, Wook ; Hall, Neal A. ; Zhou, Zhiping ; Degertekin, F. Levent
Author_Institution :
G. W. Woodruff Sch. of Mech. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
Abstract :
Implementation and characterization of a micromachined acoustic sensor with integrated optoelectronic readout is described. The mechanical part of the sensor is surface micromachined on a quartz substrate and consists of an aluminum membrane which is electrostatically actuated by a back electrode shaped in the form of a diffraction grating. Optical detection is performed by measuring the reflected diffraction orders when the grating is illuminated through the quartz substrate. This scheme provides interferometric displacement detection sensitivity as well as a compact optical interconnect to a custom designed silicon photodetector array fabricated with n-well CMOS technology. The array also contains optical apertures formed by post-CMOS deep reactive ion etching for backside illumination. A compact hybrid packaged sensor array is formed by bonding the silicon photodetector array to the quartz substrate, resulting in an integrated acoustic sensor volume of 2.5 mm3. Experimental characterization has been performed on integrated sensors with 200-mm-diameter, 1-mm-thick aluminum membranes. The results show a minimum detectable membrane displacement of 2.08×10-4 Å/√Hz at 20 kHz and 1.35×10-4 Å/√Hz at 100 kHz with 61-mW laser power detected on the integrated photodetector. Operation of the device with a pulsed vertical cavity surface emitting laser as the light source and differential detection of diffraction orders for noise reduction are demonstrated to show the potential for low-power, low-cost micromachined acoustic sensors.
Keywords :
acoustic transducer arrays; aluminium; diffraction gratings; displacement measurement; electrostatic actuators; integrated optics; integrated optoelectronics; light interferometry; micromachining; microsensors; optical interconnections; photodetectors; quartz; silicon; sputter etching; surface emitting lasers; 1 mum; 100 kHz; 20 kHz; 200 mum; 61 muW; aluminum membrane; back electrode; backside illumination; diffraction grating; electrostatic actuation; integrated optical readout; interferometric displacement detection sensitivity; membrane displacement; micromachined acoustic sensor; n-well CMOS technology; noise reduction; optical apertures; optical interconnect; post-CMOS deep reactive ion etching; pulsed vertical cavity surface emitting laser; quartz substrate; reflected diffraction orders; silicon photodetector array; Acoustic sensors; Acoustic signal detection; Biomembranes; Integrated optics; Optical arrays; Optical device fabrication; Optical interferometry; Optical sensors; Sensor arrays; Sensor phenomena and characterization; Acoustic sensor; MEMS; microelectromechanical systems; optical readout; phase-sensitive diffraction grating;
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
DOI :
10.1109/JSTQE.2004.829198