Development of MOCVD Technology for Integrated YBCO Layer/Buffer Layer Fabrication for Coated Conductors

Author

Molodyk, Alexander ; Novozhilov, Mikhail ; Bitkowsky, Scott ; Street, Susan ; Delaney, Albert ; Castellani, Louis ; Ignatiev, Alex

Author_Institution

Metal Oxide Technol. Inc. (MetOx), Houston, TX, USA

Volume

19

Issue

3

fYear

2009

fDate

6/1/2009 12:00:00 AM

Firstpage

3196

Lastpage

3199

Abstract

Chemical deposition of all buffer and YBCO layers is recognized as the most economical approach to coated conductor manufacturing. Metal Oxide Technologies Inc. (MetOx) has been developing a cost-effective technology to deposit all buffer and superconducting layers by MOCVD. High I_c = 201 A/cm and J_c = 1.53 MA/cm² values are obtained on ORNL RABiTS buffers. The best superconducting properties of MetOx YBCO films of J_c = 3.34 MA/cm² and I_c = 480 A/cm have been achieved on LANL IBAD buffers. MetOx MOCVD coated conductors demonstrate promising I_c = 137 A/cm and J_c = 1.10 MA/cm². Good superconducting performance has been demonstrated on several 1 m long YBCO tapes. Pinning enhancement via Y₂O₃ doping in YBCO has been successfully implemented. Very high MOCVD growth rates of 1.25 mum/min have been demonstrated producing well-textured superconducting YBCO films.

Keywords

MOCVD; barium compounds; buffer layers; critical current density (superconductivity); doping; flux pinning; high-temperature superconductors; superconducting tapes; superconducting thin films; yttrium compounds; LANL IBAD buffers; MOCVD technology; YBa₂Cu₃O_7-delta:Y₂O₃; buffer layer; chemical deposition; coated conductors; doping; metal oxide technology; pinning enhancement; superconducting layers; superconducting tapes; well-textured superconducting films; Buffer layers; MOCVD; YBCO; coated conductors;

fLanguage

English

Journal_Title

Applied Superconductivity, IEEE Transactions on

Publisher

ieee

ISSN

1051-8223

Type

jour

DOI

10.1109/TASC.2009.2018147

Filename

5067212