Title :
Development of MOCVD Technology for Integrated YBCO Layer/Buffer Layer Fabrication for Coated Conductors
Author :
Molodyk, Alexander ; Novozhilov, Mikhail ; Bitkowsky, Scott ; Street, Susan ; Delaney, Albert ; Castellani, Louis ; Ignatiev, Alex
Author_Institution :
Metal Oxide Technol. Inc. (MetOx), Houston, TX, USA
fDate :
6/1/2009 12:00:00 AM
Abstract :
Chemical deposition of all buffer and YBCO layers is recognized as the most economical approach to coated conductor manufacturing. Metal Oxide Technologies Inc. (MetOx) has been developing a cost-effective technology to deposit all buffer and superconducting layers by MOCVD. High Ic = 201 A/cm and Jc = 1.53 MA/cm2 values are obtained on ORNL RABiTS buffers. The best superconducting properties of MetOx YBCO films of Jc = 3.34 MA/cm2 and Ic = 480 A/cm have been achieved on LANL IBAD buffers. MetOx MOCVD coated conductors demonstrate promising Ic = 137 A/cm and Jc = 1.10 MA/cm2. Good superconducting performance has been demonstrated on several 1 m long YBCO tapes. Pinning enhancement via Y2O3 doping in YBCO has been successfully implemented. Very high MOCVD growth rates of 1.25 mum/min have been demonstrated producing well-textured superconducting YBCO films.
Keywords :
MOCVD; barium compounds; buffer layers; critical current density (superconductivity); doping; flux pinning; high-temperature superconductors; superconducting tapes; superconducting thin films; yttrium compounds; LANL IBAD buffers; MOCVD technology; YBa2Cu3O7-delta:Y2O3; buffer layer; chemical deposition; coated conductors; doping; metal oxide technology; pinning enhancement; superconducting layers; superconducting tapes; well-textured superconducting films; Buffer layers; MOCVD; YBCO; coated conductors;
Journal_Title :
Applied Superconductivity, IEEE Transactions on
DOI :
10.1109/TASC.2009.2018147
