DocumentCode :
1061013
Title :
Magnetic and recording characteristics of Co-Cr-Ta/Cr thin film prepared on Si substrate
Author :
Kawanabe, T. ; Park, J.G. ; Naoe, M.
Author_Institution :
IBM Japan, Kanagawa, Japan
Volume :
27
Issue :
6
fYear :
1991
fDate :
11/1/1991 12:00:00 AM
Firstpage :
5031
Lastpage :
5033
Abstract :
Co85Cr15-xTax (x:0,2)/Cr films with microscopic flat surfaces were investigated for high-density recording media. These films were deposited on silicon disk substrates at the substrate temperature Ts of 350°C at argon pressure as low as sub-mTorr by using facing targets sputtering (FTS) apparatus. The elevating of Ts promoted the in-plane c-axis orientation of Co crystallites. The media noise due to zigzag domain was found to be reduced by using a Cr underlayer as thick as 2500 Å at Ts of 350°C. Media noise due to the non-uniform state of magnetization in the writing process can be reduced by using a smooth underlayer, suggesting that smooth film is preferable for high density recording
Keywords :
X-ray diffraction examination of materials; chromium; chromium alloys; cobalt alloys; coercive force; ferromagnetic properties of substances; hard discs; magnetic recording; magnetic thin films; magnetisation; sputtered coatings; tantalum alloys; 2500 angstroms; 350 degC; AR pressure; Co crystallites; Co85Cr15-xTax-Cr films; Cr; Si disk substrate; X-ray diffraction; coercivity; facing targets sputtering apparatus; high-density recording media; in-plane c-axis orientation; magnetic thin film; magnetization; media noise; microscopic flat surfaces; recording characteristics; semiconductor; substrate temperature; thin film disk; writing process; zigzag domain; Chromium; Disk recording; Magnetic films; Magnetic recording; Microscopy; Noise reduction; Semiconductor films; Silicon; Substrates; Temperature;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.278730
Filename :
278730
Link To Document :
بازگشت