Magnetic and recording characteristics of Co-Cr-Ta/Cr thin film prepared on Si substrate

Author

Kawanabe, T. ; Park, J.G. ; Naoe, M.

Author_Institution

IBM Japan, Kanagawa, Japan

Volume

27

Issue

6

fYear

1991

fDate

11/1/1991 12:00:00 AM

Firstpage

5031

Lastpage

5033

Abstract

Co₈₅Cr_15-xTa_x (x:0,2)/Cr films with microscopic flat surfaces were investigated for high-density recording media. These films were deposited on silicon disk substrates at the substrate temperature T_s of 350°C at argon pressure as low as sub-mTorr by using facing targets sputtering (FTS) apparatus. The elevating of T_s promoted the in-plane c-axis orientation of Co crystallites. The media noise due to zigzag domain was found to be reduced by using a Cr underlayer as thick as 2500 Å at T_s of 350°C. Media noise due to the non-uniform state of magnetization in the writing process can be reduced by using a smooth underlayer, suggesting that smooth film is preferable for high density recording

Keywords

X-ray diffraction examination of materials; chromium; chromium alloys; cobalt alloys; coercive force; ferromagnetic properties of substances; hard discs; magnetic recording; magnetic thin films; magnetisation; sputtered coatings; tantalum alloys; 2500 angstroms; 350 degC; AR pressure; Co crystallites; Co₈₅Cr_15-xTa_x-Cr films; Cr; Si disk substrate; X-ray diffraction; coercivity; facing targets sputtering apparatus; high-density recording media; in-plane c-axis orientation; magnetic thin film; magnetization; media noise; microscopic flat surfaces; recording characteristics; semiconductor; substrate temperature; thin film disk; writing process; zigzag domain; Chromium; Disk recording; Magnetic films; Magnetic recording; Microscopy; Noise reduction; Semiconductor films; Silicon; Substrates; Temperature;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.278730

Filename

278730