• DocumentCode
    1061173
  • Title

    Functional modeling of integrated injection logic—Transient analysis

  • Author

    Rofail, Samir S. ; Elmasry, Mohamed I. ; Heasell, Edwin L.

  • Author_Institution
    University of Waterloo, Waterloo, Ont., Canada
  • Volume
    25
  • Issue
    9
  • fYear
    1978
  • fDate
    9/1/1978 12:00:00 AM
  • Firstpage
    1120
  • Lastpage
    1125
  • Abstract
    A transient analysis of integrated-injection logic I2L structures is presented. This analysis is based on calculating the different depletion and neutral region charges. Doping profile, high-level effects, and geometrical layout are taken into account. To formulate a transient functional model of the structure, regional transient delays are defined as ratios of the corresponding charges to the electron current density Jnof the n-p-n vertical transistor. An analytical expression is given for the dominant storage time; τepi. The ratio of the stored charges in a metal-covered and oxide-covered base region is related to the surface recombination velocity and the ratio of the corresponding current densities. In a partitioned CAD model (as in Berger´s injection model), the regional transient delays are expressed in terms of the corresponding current densities rather than Jn. The computed results for a five-state ring oscillator are compared to measurements.
  • Keywords
    Charge carrier processes; Current density; Delay; Doping profiles; Electrons; Epitaxial layers; Leakage current; Logic; Semiconductor process modeling; Transient analysis;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1978.19235
  • Filename
    1479629