DocumentCode
1061173
Title
Functional modeling of integrated injection logic—Transient analysis
Author
Rofail, Samir S. ; Elmasry, Mohamed I. ; Heasell, Edwin L.
Author_Institution
University of Waterloo, Waterloo, Ont., Canada
Volume
25
Issue
9
fYear
1978
fDate
9/1/1978 12:00:00 AM
Firstpage
1120
Lastpage
1125
Abstract
A transient analysis of integrated-injection logic I2L structures is presented. This analysis is based on calculating the different depletion and neutral region charges. Doping profile, high-level effects, and geometrical layout are taken into account. To formulate a transient functional model of the structure, regional transient delays are defined as ratios of the corresponding charges to the electron current density Jn of the n-p-n vertical transistor. An analytical expression is given for the dominant storage time; τepi . The ratio of the stored charges in a metal-covered and oxide-covered base region is related to the surface recombination velocity and the ratio of the corresponding current densities. In a partitioned CAD model (as in Berger´s injection model), the regional transient delays are expressed in terms of the corresponding current densities rather than Jn . The computed results for a five-state ring oscillator are compared to measurements.
Keywords
Charge carrier processes; Current density; Delay; Doping profiles; Electrons; Epitaxial layers; Leakage current; Logic; Semiconductor process modeling; Transient analysis;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1978.19235
Filename
1479629
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