Title :
Fabrication of novel three-dimensional microstructures by the anisotropic etching of
Author :
Bassous, E. ; BASSOUS, ERNEST
Author_Institution :
IBM Thomas J. Watson Research Center, Yorktown Heights, NY
fDate :
10/1/1978 12:00:00 AM
Abstract :
The anisotropic etching of single crystal silicon of
Keywords :
Anisotropic magnetoresistance; Connectors; Crystallography; Etching; Fabrication; Geometry; Microstructure; Optical surface waves; Silicon; Substrates;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1978.19249
