• DocumentCode
    1061320
  • Title

    Fabrication of novel three-dimensional microstructures by the anisotropic etching of

  • Author

    Bassous, E. ; BASSOUS, ERNEST

  • Author_Institution
    IBM Thomas J. Watson Research Center, Yorktown Heights, NY
  • Volume
    25
  • Issue
    10
  • fYear
    1978
  • fDate
    10/1/1978 12:00:00 AM
  • Firstpage
    1178
  • Lastpage
    1185
  • Abstract
    The anisotropic etching of single crystal silicon of
  • Keywords
    Anisotropic magnetoresistance; Connectors; Crystallography; Etching; Fabrication; Geometry; Microstructure; Optical surface waves; Silicon; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1978.19249
  • Filename
    1479643
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1061320