• DocumentCode
    1061381
  • Title

    Improved performance of GaAs microwave field-effect transistors with low inductance via-connections through the substrate

  • Author

    D´Asaro, L.A. ; Dilorenzo, James V. ; Fukui, Hatsuaki

  • Author_Institution
    Bell Laboratories, Murray Hill, NJ
  • Volume
    25
  • Issue
    10
  • fYear
    1978
  • fDate
    10/1/1978 12:00:00 AM
  • Firstpage
    1218
  • Lastpage
    1221
  • Abstract
    Reduced inductance via-connections to source electrodes through the substrate of GaAs MESFET´s have been fabricated in a reproducible manner by means of etching, electroless gold plating, and electroplating. The short gold-plated source connections reduce the common-lead parasitic source inductance by a large factor, resulting in gain increases of 2 dB at 4 GHz. At higher frequencies, the improvement over conventionally bonded transistors would become more pronounced.
  • Keywords
    FETs; Fabrication; Gallium arsenide; Inductance; MESFETs; Microwave devices; Plasma applications; Plasma devices; Solid state circuits; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1978.19255
  • Filename
    1479649