DocumentCode
1061588
Title
Thermal characteristics of buried-heterostructure injection lasers
Author
Tsukada, Toshihisa ; Shima, Yasuji
Author_Institution
Hitachi Ltd., Kokubunji, Tokyo, Japan
Volume
11
Issue
7
fYear
1975
fDate
7/1/1975 12:00:00 AM
Firstpage
494
Lastpage
498
Abstract
The thermal characteristics and CW operation of buried-heterostructure (BH) injection lasers, in which the GaAs active regions are completely buried in Ga1-x Alx As, are described. The narrow active regions of these diodes facilitate effective heat dissipation. Thus, the CW operation of these lasers has been achieved without the p-GaAs layers usually grown in double-heterostructure (DH) lasers for electrical contacting purposes and with the heat dissipation through n-GaAs substrates. Even in this disadvantageous configuration, the temperature rise in the active regions of BH lasers at threshold is much smaller than that of p-side-down DH lasers. The calculation using an approximate formula can explain these low experimental values fairly well. Due to low operating current and effective heat dissipation, BH lasers can be operated continuously at room temperature on very small heat sinks such as TO-5 transistor headers.
Keywords
DH-HEMTs; Diode lasers; Geometrical optics; Heat sinks; Laser modes; Laser stability; Semiconductor lasers; Temperature; Thermal resistance; Threshold current;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/JQE.1975.1068662
Filename
1068662
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