• DocumentCode
    1061596
  • Title

    The Computerized use of Transient Thermal Resistance to Avoid Forware Biased Second Breakdown in Transistors

  • Author

    Locher, Ralph E.

  • Author_Institution
    General Electric Company Semiconductor Products Department
  • Issue
    2
  • fYear
    1971
  • fDate
    5/1/1971 12:00:00 AM
  • Firstpage
    55
  • Lastpage
    61
  • Abstract
    The power handling capability of any transistor is limited by its peak junction temperature. Equally as important as the more familiar ICBO thermal runaway is a second, thermally related, phenomenon called forward biased second breakdown (S/B). Much has been written on S/B (see Ref. 1 for a thorough description and bibliography) but it is sufficient here to say that S/B is a potentially destructive phenomena that can occur in any bipolar transistor when the energy absorbed exceeds a critical value and creates a hot spot within the pellet. If the temperature of the hot spot is left unchecked, it will eventually cause the space-charge layer to collapse resulting in the transistor assuming a low resistance state.
  • Keywords
    Capacitance; Electric breakdown; Equations; Power generation; Resistance heating; Silicon; Space heating; Temperature; Thermal conductivity; Thermal resistance;
  • fLanguage
    English
  • Journal_Title
    Broadcast and Television Receivers, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9308
  • Type

    jour

  • DOI
    10.1109/TBTR1.1971.299558
  • Filename
    4079910