DocumentCode

1061670

Title

MA-3 E-beam exposure for semiconductor device lithography

Author

Weber, E.V. ; Moore, R.D.

Volume

25

Issue

11

fYear

1978

fDate

11/1/1978 12:00:00 AM

Firstpage

1339

Lastpage

1339

Keywords

Costs; Fabrication; Gallium arsenide; Lithography; Probes; Semiconductor devices; Silicon; Switches; Switching circuits; Very large scale integration;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

jour

DOI

10.1109/T-ED.1978.19283

Filename

1479677