Title :
Striped-substrate double-heterostructure lasers
Author :
Burnham, R.D. ; Scifres, D.R. ; Tramontana, J. ; Alimonda, A.S.
Author_Institution :
Xerox Corp., Palo Alto, CA, USA
fDate :
7/1/1975 12:00:00 AM
Abstract :
A different type of stripe-geometry laser is demonstrated in which current confinement is achieved by selective diffusion of the n-type substrate prior to growth of the GaAs/GaAlAs heterostructure layers. This structure exhibits low room-temperature threshold currents resulting from the small lateral-current spreading from the edges of the stripe. Lowest order transverse-mode operation is achieved for stripe widths of 10μm.
Keywords :
Absorption; DH-HEMTs; Diodes; Fabrication; Gallium arsenide; Geometry; Iron; Ohmic contacts; P-n junctions; Zinc;
Journal_Title :
Quantum Electronics, IEEE Journal of
DOI :
10.1109/JQE.1975.1068674