DocumentCode :
1061984
Title :
TP-A1 shallow-level electron traps in SiO2
Author :
Ning, Tak H.
Volume :
25
Issue :
11
fYear :
1978
fDate :
11/1/1978 12:00:00 AM
Firstpage :
1348
Lastpage :
1348
Keywords :
Aluminum; Boats; Electron traps; FETs; Heating; Human computer interaction; Radio frequency; Silicon; Temperature; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1978.19314
Filename :
1479708
Link To Document :
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