DocumentCode

1062254

Title

WP-A2 the use of a scanned continuous laser beam for annealing of ion implantation damage in silicon

Author

Gat, A. ; Gibbons, J.F.

Volume

25

Issue

11

fYear

1978

fDate

11/1/1978 12:00:00 AM

Firstpage

1357

Lastpage

1357

Keywords

Amorphous materials; Annealing; Implants; Ion implantation; Laser beams; Lenses; Semiconductor lasers; Silicon; Surface emitting lasers; Thermal resistance;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

jour

DOI

10.1109/T-ED.1978.19340

Filename

1479734