Title :
WP-A7 some physical properties of dry high-pressure oxide films on silicon
Author :
Irene, E.A. ; Dong, D.W.
fDate :
11/1/1978 12:00:00 AM
Keywords :
Absorption; Density measurement; Optical films; Optical refraction; Optical saturation; Refractive index; Residual stresses; Semiconductor films; Silicon; Temperature;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1978.19348
