DocumentCode
1062444
Title
The heat-flow problem in silicon: An approach to an analytical solution with application to the calculation of thermal instability in bipolar devices
Author
Heasell, E.L.
Author_Institution
University of Waterloo, Waterloo, Ont., Canada
Volume
25
Issue
12
fYear
1978
fDate
12/1/1978 12:00:00 AM
Firstpage
1382
Lastpage
1388
Abstract
The experimental data for the temperature dependence of the thermal conductivity of silicon are reviewed. It is proposed that an empirical formula of the form
provides a good description of the measurements. The steady-state heat-flow equations are formulated so that the nonlinear heat-flow problem may be solved in terms of an equivalent linear problem. The method is applied in conjunction with an idealized thermal and electrical device model, to calculate the thermal instability boundary (or second breakdown boundary), of a commercial power transistor.
provides a good description of the measurements. The steady-state heat-flow equations are formulated so that the nonlinear heat-flow problem may be solved in terms of an equivalent linear problem. The method is applied in conjunction with an idealized thermal and electrical device model, to calculate the thermal instability boundary (or second breakdown boundary), of a commercial power transistor.Keywords
Electric breakdown; Fingers; Geometry; Power transistors; Silicon; Steady-state; Temperature dependence; Temperature distribution; Thermal conductivity; Thermal resistance;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1978.19359
Filename
1479753
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