• DocumentCode
    1062444
  • Title

    The heat-flow problem in silicon: An approach to an analytical solution with application to the calculation of thermal instability in bipolar devices

  • Author

    Heasell, E.L.

  • Author_Institution
    University of Waterloo, Waterloo, Ont., Canada
  • Volume
    25
  • Issue
    12
  • fYear
    1978
  • fDate
    12/1/1978 12:00:00 AM
  • Firstpage
    1382
  • Lastpage
    1388
  • Abstract
    The experimental data for the temperature dependence of the thermal conductivity of silicon are reviewed. It is proposed that an empirical formula of the form K = K_{0}/(T-T_{0}) provides a good description of the measurements. The steady-state heat-flow equations are formulated so that the nonlinear heat-flow problem may be solved in terms of an equivalent linear problem. The method is applied in conjunction with an idealized thermal and electrical device model, to calculate the thermal instability boundary (or second breakdown boundary), of a commercial power transistor.
  • Keywords
    Electric breakdown; Fingers; Geometry; Power transistors; Silicon; Steady-state; Temperature dependence; Temperature distribution; Thermal conductivity; Thermal resistance;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1978.19359
  • Filename
    1479753