Title :
Submicron-trackwidth inductive/MR composite head
Author :
Takano, Hisashi ; Fukuoka, Hirotsugu ; Suzuki, Mikio ; Shiiki, Kazuo ; Kitada, Masahiro
Author_Institution :
Hitachi Ltd., Tokyo, Japan
fDate :
11/1/1991 12:00:00 AM
Abstract :
To explore the possibility for ultra-high areal density recording, submicron-trackwidth inductive-write/magnetoresistive-(MR)-read composite heads were fabricated. The focused ion beam etching technique was applied to fabricate a ~1-μm-wide write-track completely aligned to the read-region of the MR sensor. The write head using multilayered Fe-based alloy pole pieces with a saturation magnetization of 2.0 T revealed sufficient writability and excellent frequency response. A shunt-biased MR sensor having a narrow gap-length operated at a high current density over 3×107 A/cm2 is developed to reproduce a sufficient signal amplitude at high linear-density regions. Recording tests were carried out on a thin-film medium with a head-medium clearance of 0.05 μm. The output voltage per micron of trackwidth over 400 μV with symmetrical pulses, and a -6-dB rolloff density of around 90 kFCI were measured. The design procedure, fabrication method, and recording performances of the submicron-trackwidth inductive/MR composite heads which can attain 2 gigabits recording are discussed
Keywords :
magnetic heads; magnetic recording; magnetoresistance; sputter etching; 2 Gbit; 2 T; current density; focused ion beam etching technique; frequency response; inductive-write/magnetoresistive-read composite head; multilayered Fe-based alloy pole pieces; output voltage; rolloff density; saturation magnetization; shunt-biased MR sensor; signal amplitude; submicron-trackwidth inductive/MR composite heads; ultra-high areal density recording; write head; Current density; Disk recording; Etching; Frequency response; Ion beams; Magnetic heads; Magnetic sensors; Magnetoresistance; Pulse measurements; Saturation magnetization;
Journal_Title :
Magnetics, IEEE Transactions on