DocumentCode :
106291
Title :
Low-Voltage Atmospheric-Plasma Generation by Utilizing Afterglow Initiation Carrier
Author :
Lee, Lun-Hui ; Youngmin Kim
Author_Institution :
Sch. of Electron. & Electr. Eng., Hongik Univ., Seoul, South Korea
Volume :
41
Issue :
1
fYear :
2013
fDate :
Jan. 2013
Firstpage :
155
Lastpage :
158
Abstract :
Low-voltage atmospheric-plasma generation is reported, in which the breakdown voltage is significantly reduced by utilizing afterglow ions generated on integrated electrodes. Using micromachining techniques, a microanode and two microcathodes were integrated on a glass substrate. Atmospheric glow discharge was first generated in the narrow gap of 10 μm, and the resulting afterglow ions were utilized as an initiation carrier in a subsequent discharge induced in the wide gap of 270 μm. In the presence of the initiation carrier, the atmospheric glow discharge was generated at a substantially low voltage. The feasibility of the proposed generation scheme as an efficient compact plasma source is also evaluated.
Keywords :
afterglows; electrodes; glow discharges; micromachining; plasma sources; afterglow initiation carrier; atmospheric glow discharge; breakdown voltage; glass substrate; integrated electrodes; low-voltage atmospheric-plasma generation; microanode; microcathodes; micromachining techniques; plasma source; size 10 mum; size 270 nm; Cathodes; Discharges (electric); Fault location; Glow discharges; Plasmas; Afterglow; atmospheric plasma; initiation carrier; plasma on a chip;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2012.2230275
Filename :
6395263
Link To Document :
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