• DocumentCode
    1062992
  • Title

    The crystallography and texture of Co-based thin film deposited on Cr underlayers

  • Author

    Laughlin, David E. ; Wong, Bunsen Y.

  • Author_Institution
    Dept. of Metall. Eng. & Mater. Sci., Carnegie Mellon Univ., Pittsburgh, PA, USA
  • Volume
    27
  • Issue
    6
  • fYear
    1991
  • fDate
    11/1/1991 12:00:00 AM
  • Firstpage
    4713
  • Lastpage
    4717
  • Abstract
    Some of the evidence for the effect of Cr orientation on the crystallographic orientation of Co-based thin films is presented. The authors review four experimental techniques that can be used to investigate the orientation relationships (OR) between the magnetic Co-based film and the Cr underlayer. These techniques are X-ray diffraction, selected area (electron) diffraction (SAD), electron microdiffraction, and atomic resolution electron microscopy of cross sections of the bi-layer films. The authors focus on the crystallographic orientation relationships between the grains in the magnetic film and those in the Cr (BCC) underlayer. The magnetic films discussed are all alloys of Co, usually with HCP structure
  • Keywords
    X-ray diffraction examination of materials; chromium alloys; cobalt alloys; crystal orientation; electron diffraction examination of materials; electron microscope examination of materials; ferromagnetic properties of substances; magnetic recording; magnetic thin films; nickel alloys; surface texture; BCC underlayer; CoNiCr-Cr; Cr orientation; Cr underlayers; HCP structure; X-ray diffraction; atomic resolution electron microscopy; bilayer films; crystallographic orientation; electron microdiffraction; hard disk; magnetic film; magnetic recording; selected area electron diffraction; texture; Chromium alloys; Cobalt alloys; Crystallography; Electrons; Magnetic films; Magnetic recording; Materials science and technology; Sputtering; Transistors; X-ray diffraction;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.278924
  • Filename
    278924