Title :
Improved high moment FeAlN/SiO2 laminated materials for thin film recording heads
Author :
Wang, S. ; Obermyer, K.E. ; Kryder, M.H.
Author_Institution :
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
fDate :
11/1/1991 12:00:00 AM
Abstract :
FeAlN films and FeAlN/SiO2 multilayers have been studied for head applications. The magnetic properties of FeAlN show similar dependences on N2/Ar flow rate ratio as those of FeN, but Al has been found to significantly affect their coercivity and magnetostriction, and also to prevent grain growth during annealing. FeAlN/SiO2 multilayers also show similar dependences on the sputtering parameters as FeN/SiO2. However, they demonstrate better magnetic properties and superior thermal stability when annealed at 300°C. Multilayers with a saturation magnetization of 20 KGauss, a coercivity of 0.3 Oe, a saturation magnetostriction constant less than 2×10-7 and a permeability of 4000 have been achieved
Keywords :
aluminium compounds; coercive force; ferromagnetic properties of substances; iron compounds; magnetic anisotropy; magnetic heads; magnetic thin film devices; magnetic thin films; magnetostriction; silicon compounds; sputtered coatings; FeAlN-SiO2 multilayers; anisotropy; annealed; coercivity; high moment FeAlN/SiO2 laminated materials; magnetic properties; magnetostriction; permeability; saturation magnetostriction constant; sputtering parameters; thermal stability; thin film recording heads; Annealing; Argon; Coercive force; Magnetic films; Magnetic heads; Magnetic multilayers; Magnetic properties; Magnetostriction; Sputtering; Thermal stability;
Journal_Title :
Magnetics, IEEE Transactions on
