DocumentCode :
1063622
Title :
Modeling of minority-carrier transport in semiconductor regions with position-dependent material parameters at arbitrary injection levels
Author :
Rinaldi, Niccolo F.
Author_Institution :
Dipartimento di Ingegneria Elettronica, Naples Univ., Italy
Volume :
43
Issue :
8
fYear :
1996
fDate :
8/1/1996 12:00:00 AM
Firstpage :
1256
Lastpage :
1263
Abstract :
An analytical treatment of minority-carrier transport in bipolar transistors under arbitrary injection levels is presented. The analysis is not restricted to particular doping profiles and applies also to SiGe devices. As a first result, it is demonstrated that the minority-carrier transport equation is exactly soluble at high-injection (HI) levels, yielding closed-form expressions for the injected current, transit time, and sheet resistance. Contrary to the presently available formula which is recovered here as a particular case, our result reveals that the HI transit time is strongly affected by band-gap narrowing effects. It is also found that the transit time increase due to velocity saturation is more pronounced at HI levels than at low-injection (LI) levels. An analytical formulation for the collector current density, base transit time, and base sheet resistance, valid at any injection level, is then proposed. The analysis is based on the construction of approximate solutions of the transport equation. Finally, a simple expression for the effective electric field is derived, which allows one to more clearly study its variation with the injection level, and to easily take into account the electric field-dependence of the mobility
Keywords :
bipolar transistors; carrier mobility; doping profiles; energy gap; minority carriers; semiconductor device models; approximate solutions; band-gap narrowing effects; base sheet resistance; base transit time; bipolar transistors; carrier mobility; closed-form expressions; collector current density; effective electric field; injection levels; minority-carrier transport; position-dependent material parameters; semiconductor regions; velocity saturation; Bipolar transistors; Closed-form solution; Current density; Doping profiles; Electric resistance; Equations; Germanium silicon alloys; Photonic band gap; Semiconductor process modeling; Silicon germanium;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.506777
Filename :
506777
Link To Document :
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