• DocumentCode
    1063686
  • Title

    Unified physical I-V model including self-heating effect for fully depleted SOI/MOSFET´s

  • Author

    Cheng, Yuhua ; Fjeldly, Tor A.

  • Author_Institution
    Dept. of Phys. Electron., Norwegian Inst. of Technol., Trondheim, Norway
  • Volume
    43
  • Issue
    8
  • fYear
    1996
  • fDate
    8/1/1996 12:00:00 AM
  • Firstpage
    1291
  • Lastpage
    1296
  • Abstract
    A physically based analytical I-V model that includes self-heating effect (SHE) is presented for fully depleted SOI/MOSFET´s. The incorporation of SHE is done self-consistently in a fully closed form, making the model very suitable for use in circuit simulators. The model also accounts for the drain induced conductivity enhancement (DICE) and drain induced barrier lowering (DIBL), channel length modulation (CLM), as well as parasitic series resistances (PSR). Another advantage is the unified form of the model that allows us to describe the subthreshold, the near-threshold and the above-threshold regimes of operation in one continuous expression. A continuous transition of current and conductance from the linear to the saturation regimes is also assured. The model shows good agreement with measured data for a wide range of channel lengths (down to 0.28 μm) and film thicknesses (94 nm-162 nm)
  • Keywords
    MOSFET; SPICE; circuit analysis computing; semiconductor device models; silicon-on-insulator; 94 to 162 nm; above-threshold regime; channel length modulation; channel lengths; circuit simulators; continuous transition; drain induced barrier lowering; drain induced conductivity enhancement; film thicknesses; fully closed form; fully depleted SOI/MOSFET; near-threshold regime; parasitic series resistances; saturation regimes; self-heating effect; subthreshold regime; unified physical I-V model; Analytical models; Circuit analysis computing; Circuit simulation; Computational modeling; Electrical resistance measurement; Length measurement; MOSFET circuits; Temperature dependence; Thermal conductivity; Thickness measurement;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.506782
  • Filename
    506782