Title :
Nonlinear source and drain resistance in recessed-gate heterostructure field-effect transistors
Author :
Greenberg, David R. ; del Alamo, Jesús A.
Author_Institution :
MIT, Cambridge, MA, USA
fDate :
8/1/1996 12:00:00 AM
Abstract :
We have profiled the parasitic source and drain resistances versus current in recessed-gate HFET´s with heavily-doped caps, using an InAlAs/n+-InP HFET as a vehicle. We observe a dramatic reduction in the parasitic resistances at moderate-to-high currents as significant current passes through the cap. Consequently, we note very little dependence in g, on the length of the extrinsic gate-source region. This is an experimental verification of predictions of two-layer models in the literature
Keywords :
III-V semiconductors; aluminium compounds; characteristics measurement; electric resistance; heavily doped semiconductors; indium compounds; millimetre wave field effect transistors; millimetre wave power transistors; power field effect transistors; InAlAs-InP; extrinsic gate-source region; heavily-doped caps; mm-wave power FETs; nonlinear resistance; parasitic drain resistance; parasitic source resistance; recessed-gate heterostructure field-effect transistors; two-layer models; Etching; HEMTs; MODFETs; Millimeter wave technology; Millimeter wave transistors; Predictive models; Thermal degradation; Thermal resistance; Vehicles; Voltage;
Journal_Title :
Electron Devices, IEEE Transactions on