Title :
Optimum beam size for high-speed drawing of LSI patterns by variably shaped rectangular electron beams
Author :
Hoh, Koitiro ; Sugiyama, Naoshi ; Tarui, Yasuo
Author_Institution :
VLSI Technology Research Association, Kawasaki, Japan
fDate :
9/1/1979 12:00:00 AM
Abstract :
The drawing time of the vector-scan electron-beam exposure systems employing variably shaped rectangular (VSR) beams is calculated and the optimum value of the maximum dimension of the rectangle is found which makes the drawing time minimum under the condition that the edge slope is within a certain fraction of the linewidth.
Keywords :
Apertures; Electron beams; High speed optical techniques; Large scale integration; Lithography; Optical control; Optical devices; Particle beams; Shape control; Silicon;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1979.19608
