• DocumentCode
    1065703
  • Title

    Dynamic model and electrical characteristics for RF-biased electronegative plasma sheath

  • Author

    Lee, Young D. ; Oh, Jae J. ; Shin, Jai Kwang

  • Author_Institution
    Computational Sci. & Eng. Center, Samsung Adv. Inst. of Technol., Suwon, South Korea
  • Volume
    30
  • Issue
    3
  • fYear
    2002
  • fDate
    6/1/2002 12:00:00 AM
  • Firstpage
    1320
  • Lastpage
    1330
  • Abstract
    The dynamic model for the sheath of an RF-biased electronegative plasma is developed. The low-pressure high-density plasma conditions are assumed and considered as an electric-field-free boundary. The Bohm criterion for collisionless sheath is assumed to be valid and the presheath region is separately considered in calculating the sheath properties. The electron density ne and the electronegativity α ≡ n-/ne are taken to be determined independently of the sheath dynamics. The time-resolved wave forms of the sheath potential and thickness are obtained. The characteristics for the RF power dissipation mechanisms are also investigated. The RF bias power is assumed to be dissipated through two power loss channels - the first is due to ion acceleration in the sheath and the second is due to the electron heating at the plasma-sheath boundary. From the power loss point of view, the equivalent circuit model is developed and the sheath impedance is calculated. The electronegativity, as well as the current and RF bias frequency, is found to be an important factor in determining the electrical characteristics for the RF-biased electronegative plasma sheath.
  • Keywords
    electronegativity; plasma density; plasma heating; plasma sheaths; plasma transport processes; Bohm criterion; RF bias frequency; RF bias power dissipation; RF power dissipation mechanisms; RF-biased electronegative plasma sheath; collisionless sheath; current; dynamic model; electric-field-free boundary; electrical characteristics; electron density; electron heating; electronegativity; equivalent circuit model; low-pressure high-density plasma conditions; plasma-sheath boundary; power loss; presheath region; sheath dynamics; sheath impedance; sheath potential; sheath properties; sheath thickness; time-resolved wave forms; Acceleration; Electric variables; Electrons; Heating; Plasma accelerators; Plasma density; Plasma properties; Plasma sheaths; Power dissipation; Radio frequency;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2002.801537
  • Filename
    1158295