DocumentCode :
1065898
Title :
Raman spectroscopic assessment of Si and Be local vibrational modes in GaAs layers grown by molecular beam epitaxy
Author :
Wagner, J. ; Ramsteiner, M.
Author_Institution :
Fraunhofer-Inst. fuer Angewandte Festkorperphys., Freiburg, West Germany
Volume :
25
Issue :
5
fYear :
1989
fDate :
5/1/1989 12:00:00 AM
Firstpage :
993
Lastpage :
996
Abstract :
A Raman study of heavily Si- and Be-doped GaAs grown by molecular beam epitaxy is discussed. Both impurities give rise to local vibrational modes (LVM) which can be observed in Raman spectroscopy for impurity concentrations exceeding ~2×1018 cm-3. Compared to absorption spectroscopy, which is the `classical´ technique to study LVMs in relatively thick (≥1 μm) layers, Raman spectroscopy permits analysis of the incorporation of both dopants in thin (≥10 nm) as-grown GaAs layers.
Keywords :
III-V semiconductors; Raman spectra of inorganic solids; beryllium; gallium arsenide; heavily doped semiconductors; lattice localised modes; semiconductor epitaxial layers; silicon; GaAs:Be; GaAs:Si; Raman spectroscopic assessment; Raman study; absorption spectroscopy; dopants; layers; local vibrational modes; molecular beam epitaxy; relatively thick layers; semiconductor; thin as-grown layers; Absorption; Gallium arsenide; Lattices; Molecular beam epitaxial growth; Optical scattering; Particle scattering; Photonic band gap; Raman scattering; Resonance; Spectroscopy;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/3.27990
Filename :
27990
Link To Document :
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