Title :
MP-B1 auger sputter profiling studies of phosphorus pileup at the Si-SiO2interface
Author :
Schwarz, S.A. ; Ho, Chu Po ; Helms, C.R.
fDate :
11/1/1979 12:00:00 AM
Keywords :
Annealing; Contracts; Laboratories; Oxidation; Plasma materials processing; Plasma measurements; Plasma temperature; Semiconductor films; Silicon compounds; Substrates;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1979.19706
