Title :
Reflectance-difference spectroscopy: a new probe of crystal growth by MBE and OMCVD
Author_Institution :
Bell Commun. Res. Inc., Red Bank, NJ, USA
fDate :
5/1/1989 12:00:00 AM
Abstract :
Reflectance-difference spectroscopy (RDS) is a normal-incidence optical technique that uses symmetry to enhance the typically low sensitivity of optical probes to surface phenomena. In RDS, the difference between reflectances parallel and perpendicular to the two principal optic axes in the plane of the surface is determined experimentally by modulation techniques. Contributions from the nearly isotropic bulk and randomly oriented surface species largely cancel in subtraction, preferentially leaving those from the lower symmetry surface. Being optical, RDS can be used in the reactive, relatively high-pressure sample ambients of organometallic chemical vapor deposition (OMCVD) reactors as well as the ultrahigh-vacuum sample environment of molecular beam epitaxy (MBE). MBE results for the (001) AlGaAs system show that reflectance-difference signals are sensitive to either surface chemistry or surface structure according to photon energy.
Keywords :
III-V semiconductors; aluminium compounds; chemical vapour deposition; gallium arsenide; light reflection; molecular beam epitaxial growth; spectroscopy; surface chemistry; surface structure; AlGaAs system; III-V semiconductors; MBE; OMCVD; RDS; crystal growth; molecular beam epitaxy; normal-incidence optical technique; organometallic chemical vapor deposition; principal optic axes; reflectance-difference spectroscopy; reflectances; surface chemistry; surface structure; Chemical vapor deposition; Molecular beam epitaxial growth; Optical films; Optical modulation; Optical scattering; Optical sensors; Photonic crystals; Plasma measurements; Probes; Spectroscopy;
Journal_Title :
Quantum Electronics, IEEE Journal of