DocumentCode :
1066079
Title :
TA-A2 sheet resistivity reduction in polycrystalline silicon by pulsed laser and CW laser annealing
Author :
Shibata, Takuma ; Lee, K.F. ; Gibbons, J.F.
Volume :
26
Issue :
11
fYear :
1979
fDate :
11/1/1979 12:00:00 AM
Firstpage :
1833
Lastpage :
1833
Keywords :
Annealing; Conductivity; Contracts; Gallium arsenide; Laser stability; Optical pulses; Silicon; Surface emitting lasers; Surface morphology; Thermal resistance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1979.19714
Filename :
1480292
Link To Document :
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