• DocumentCode
    1066090
  • Title

    TA-A3 laser and electron-beam annealing of implanted semi-insulating GaAs

  • Author

    Tandon, J.L. ; Eisen, F.H.

  • Volume
    26
  • Issue
    11
  • fYear
    1979
  • fDate
    11/1/1979 12:00:00 AM
  • Firstpage
    1833
  • Lastpage
    1833
  • Keywords
    Amorphous materials; Annealing; Doping; Gallium arsenide; Indium phosphide; Optical pulses; Solid lasers; Surface cracks; Surface emitting lasers; Surface morphology;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1979.19715
  • Filename
    1480293