DocumentCode :
1066090
Title :
TA-A3 laser and electron-beam annealing of implanted semi-insulating GaAs
Author :
Tandon, J.L. ; Eisen, F.H.
Volume :
26
Issue :
11
fYear :
1979
fDate :
11/1/1979 12:00:00 AM
Firstpage :
1833
Lastpage :
1833
Keywords :
Amorphous materials; Annealing; Doping; Gallium arsenide; Indium phosphide; Optical pulses; Solid lasers; Surface cracks; Surface emitting lasers; Surface morphology;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1979.19715
Filename :
1480293
Link To Document :
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