DocumentCode

1066108

Title

TA-A7 Ga implantation into Si at ultra-high dose rates

Author

Kubena, R.L. ; Hart, R.R. ; Dunlap, H.L. ; Clark, M.D. ; Wang, Vivien ; Anderson, C. Lindsay

Volume

26

Issue

11

fYear

1979

fDate

11/1/1979 12:00:00 AM

Firstpage

1834

Lastpage

1835

Keywords

Annealing; Chemical lasers; Gallium arsenide; Ion implantation; Laboratories; Leakage current; Optical pulses; Photovoltaic cells; Semiconductor lasers; Silicon;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

jour

DOI

10.1109/T-ED.1979.19717

Filename

1480295