• DocumentCode
    1066500
  • Title

    The dependence of the pulsed 10.6-µm laser damage threshold on the manner in which a sample is irradiated

  • Author

    Bass, M. ; Leung, K.M.

  • Author_Institution
    Center for Laser Studies, Univ. of Southern California, Los Angeles, CA, USA
  • Volume
    12
  • Issue
    2
  • fYear
    1976
  • fDate
    2/1/1976 12:00:00 AM
  • Firstpage
    82
  • Lastpage
    83
  • Abstract
    The threshold for pulsed 10.6 μm laser-induced surface and bulk damage in transparent materials has been shown to depend on the manner in which the samples are irradiated. When a site is irradiated several times, starting at a very low intensity and increasing the flux a few percent on successive shots until damage occurs, the threshold is often higher than if each site were irradiated only once. In addition, it has been shown that the damage threshold also depends on the sample tested and so the use of relative damage-threshold measurements to identify the damage mechanism should be reexamined.
  • Keywords
    laser beam effects; optical materials; bulk damage; damage mechanism; number of shots; pulsed 10.6 microns laser damage threshold; sample irradiation method dependence; surface damage; transparent materials; Laser modes; Laser noise; Optical materials; Optical pulses; Optical surface waves; Pulse measurements; Size measurement; Surface emitting lasers; Testing; Volume measurement;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/JQE.1976.1069098
  • Filename
    1069098