DocumentCode :
1066859
Title :
Thin-film semiconductor NOxsensor
Author :
Chang, Shih-Chia
Author_Institution :
General Motors Research Laboratories, Warren, MI
Volume :
26
Issue :
12
fYear :
1979
fDate :
12/1/1979 12:00:00 AM
Firstpage :
1875
Lastpage :
1880
Abstract :
A thin-film semiconductor NOxsensor has been fabricated by reactive RF sputtering from a tin target. The gas detection is based on monitoring the sensor resistance change caused by NOxchemisorption on the sensor surface. The sensor is highly sensitive and selective toward detecting NOxin air. The chemical composition of the film was investigated by AES and ESCA. A simple chemisorption model is presented to explain the observed phenomena.
Keywords :
Chemical sensors; Gas detectors; Monitoring; Radio frequency; Semiconductor thin films; Sensor phenomena and characterization; Sputtering; Surface resistance; Thin film sensors; Tin;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1979.19790
Filename :
1480368
Link To Document :
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