Title :
High temperature and low threshold current operation of strained AlGaInP/Ga0.4In0.6P multi-quantum well laser diodes emitting at 676 nm
Author :
Lin, Jen-Fin ; Wu, Meng-Chyi ; Chang, C.-M. ; Lee, B.-J. ; Chen, Tsung-Po
Author_Institution :
Res. Inst. of Electr. Eng., Nat. Tsing Hua Univ., Hsinchu
fDate :
3/17/1994 12:00:00 AM
Abstract :
High temperature, low threshold current, and transverse mode stabilised operation is achieved in a separate confinement heterostructure AlGaInP/Ga0.4In0.6P compressively strained multiquantum-well structure which was fabricated from an epitaxial wafer grown on misoriented (100) GaAs substrate by low-pressure metal organic vapour phase epitaxy. Remarkable improvements in threshold current and characteristic temperature (T0) have been demonstrated. The threshold current is 32 mA at room temperature and the emission wavelength is ~676 nm. The characteristic temperature between 20 and 70°C is 162 K, which is the highest CW T0 value ever reported for devices operating in the visible wavelength region without incorporating multiquantum barriers
Keywords :
III-V semiconductors; aluminium compounds; current density; gallium compounds; indium compounds; laser modes; laser transitions; semiconductor growth; semiconductor lasers; vapour phase epitaxial growth; 162 K; 20 to 130 degC; 32 mA; 676 nm; AlGaInP-Ga0.4In0.6P; characteristic temperature; compressively strained MQW structure; emission wavelength; epitaxial wafer; high temperature operation; low threshold current operation; low-pressure metal organic vapour phase epitaxy; misoriented (100) GaAs substrate; room temperature; separate confinement heterostructure; strained AlGaInP/Ga0.4In0.6P multi-quantum well laser diodes; threshold current; transverse mode stabilised operation; visible wavelength region;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19940356