DocumentCode :
1066942
Title :
Inverted mesa-type quartz crystal resonators fabricated by deep-reactive ion etching
Author :
Abe, Takashi ; Hung, Vu ; Esashi, Masayoshi
Author_Institution :
Member; Graduate School of Engineering, Tohoku University, Aramaki, Aoba-ku, Sendai 980-8579, Japan
Volume :
53
Issue :
7
fYear :
2006
fDate :
7/1/2006 12:00:00 AM
Firstpage :
1234
Lastpage :
1236
Abstract :
In this letter, we present experimental data showing Q change versus thickness for a quartz-crystal resonator fabricated with deep-reactive ion etching. Measurements show that Q increases as etch depth increases, and further that Q can be optimized as a function of etch depth and diameter of the resonator.
Keywords :
Crystals; Electrodes; Etching; Q factor; Resonant frequency; Sensors;
fLanguage :
English
Journal_Title :
Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
Publisher :
ieee
ISSN :
0885-3010
Type :
jour
DOI :
10.1109/TUFFC.2006.1665070
Filename :
1665070
Link To Document :
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