DocumentCode :
1066949
Title :
ISFET´s using inorganic gate thin films
Author :
Abe, Hiroshi ; Esashi, Masayshshi ; Mats, Tadayki
Author_Institution :
Tohoku University, Sendai, Japan
Volume :
26
Issue :
12
fYear :
1979
fDate :
12/1/1979 12:00:00 AM
Firstpage :
1939
Lastpage :
1944
Abstract :
The characteristics of various types of ISFET´s using inorganic gate films are described. The pH and pNa selectivities are investigated for SiO2, Si3N4, Al2O3, alumino-silicate, and sodium-aluminosilicate gate dielectrics. The transient response and device stability are also studied for different values of solution pH. The Al2O3gate shows a nearly ideal pH response, excellent stability, and selectivity to other cations. On the other hand, the Si3N4gate is also a good pH sensor, but it is proved by the studies of SiO2and SiOxNyfilms that the oxygen content in its surface degrades its properties as a pH sensor. Sodium-alumino-silicate, which is generally known as a material for pNa selective glass electrodes, is utilized as a gate film for the pNa ISFET. The pNa selectivity of this device is comparable to that of the conventional glass electrode. The alumino-silicate gate has also a pNa selectivity, but it is inferior to the sodium-alumino-silicate gate.
Keywords :
Electrodes; FETs; Glass; Insulation; MISFETs; Metal-insulator structures; Presence network agents; Silicon; Stability; Transistors;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1979.19799
Filename :
1480377
Link To Document :
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