DocumentCode :
1067455
Title :
Low temperature annealing of ion-implanted KNbO3 channel waveguides
Author :
Pliska, T. ; Jundt, D.H. ; Fluck, D. ; Gunter, P. ; Fleuster, M. ; Buchal, C.
Author_Institution :
Inst. of Quantum Electron., Swiss Federal Inst. of Technol., Zurich
Volume :
30
Issue :
7
fYear :
1994
fDate :
3/31/1994 12:00:00 AM
Firstpage :
562
Lastpage :
563
Abstract :
Ion implanted KNbO3 channel waveguides were annealed at 150°C for several hours. The waveguide losses were considerably reduced at visible and near-infrared wavelengths showing a minimum loss coefficient of 1.7 dB cm-1 at 633 nm. No significant change of the refractive index profile was observed
Keywords :
annealing; integrated optics; ion implantation; optical losses; optical waveguides; potassium compounds; refractive index; 150 C; 633 nm; KNbO3; KNbO3 channel waveguides; NIR; annealed; ion-implanted; low temperature annealing; minimum loss coefficient; near-infrared wavelengths; refractive index profile; visible wavelengths; waveguide losses;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19940392
Filename :
280600
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1067455
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