DocumentCode
1067755
Title
An analysis and the fabrication technology of the lambda bipolar transistor
Author
Wu, Ching-Yuan ; Wu, Chung-Yu
Author_Institution
National Chiao-Tung University, Hsin-Chu, Taiwan, Republic of China
Volume
27
Issue
2
fYear
1980
fDate
2/1/1980 12:00:00 AM
Firstpage
414
Lastpage
419
Abstract
A new type of voltage-controlled negative-differential-resistance device using the merged integrated circuit of an n-p-n (p-n-p) bipolar transistor and an n(p)-channel enhancement MOSFET, which is called the Lambda bipolar transistor, is studied both experimentally and theoretically. The principal operation of the Lambda bipolar transistor is characterized by the simple circuit model and device physics. The important device properties such as the peak voltage, the peak current, the valley voltage, and the negative differential resistance, are derived in terms of the known device parameters. Comparisons between the characteristics of the fabricated devices and the theoretical model are made, which show that the analysis is in good agreement with the observed device characteristics.
Keywords
Bipolar integrated circuits; Bipolar transistors; Fabrication; Integrated circuit technology; MOSFET circuits; Physics; Radiative recombination; Semiconductor diodes; Surface resistance; Voltage control;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1980.19877
Filename
1480670
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