• DocumentCode
    1067755
  • Title

    An analysis and the fabrication technology of the lambda bipolar transistor

  • Author

    Wu, Ching-Yuan ; Wu, Chung-Yu

  • Author_Institution
    National Chiao-Tung University, Hsin-Chu, Taiwan, Republic of China
  • Volume
    27
  • Issue
    2
  • fYear
    1980
  • fDate
    2/1/1980 12:00:00 AM
  • Firstpage
    414
  • Lastpage
    419
  • Abstract
    A new type of voltage-controlled negative-differential-resistance device using the merged integrated circuit of an n-p-n (p-n-p) bipolar transistor and an n(p)-channel enhancement MOSFET, which is called the Lambda bipolar transistor, is studied both experimentally and theoretically. The principal operation of the Lambda bipolar transistor is characterized by the simple circuit model and device physics. The important device properties such as the peak voltage, the peak current, the valley voltage, and the negative differential resistance, are derived in terms of the known device parameters. Comparisons between the characteristics of the fabricated devices and the theoretical model are made, which show that the analysis is in good agreement with the observed device characteristics.
  • Keywords
    Bipolar integrated circuits; Bipolar transistors; Fabrication; Integrated circuit technology; MOSFET circuits; Physics; Radiative recombination; Semiconductor diodes; Surface resistance; Voltage control;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1980.19877
  • Filename
    1480670