Determination of current density distribution and constriction resistance in the multiple line contact with various space angles by using conformal mapping

Author

Park, Soo-Woong ; Na, Suck-Joo

Author_Institution

Dept. of Prod. Eng., Korea Adv. Inst. of Sci. & Technol., Seoul, South Korea

Volume

11

Issue

3

fYear

1988

fDate

9/1/1988 12:00:00 AM

Firstpage

314

Lastpage

317

Abstract

The current-density distribution at the contact interface and the constriction resistance (or contact resistance in the contamination-free contact) of the multiple-line contact were calculated for various space angles by applying conformal mapping. This calculation is based on the fact that the potential to any point and the total current flowing through a contact interface are not changed by geometrical transformation. It is shown that the influence of the space angle on the current-density distribution shape at the contact interface is very great, and cannot be neglected in the prediction of the constriction resistance. However, in practice, the number of microcontacts and the ratio of real-to-apparent contact area associated with the surface roughness have only a negligible influence on the constriction resistance

Keywords

contact resistance; current density; electrical contacts; conformal mapping; constriction resistance; contact resistance; current density distribution; geometrical transformation; microcontacts; multiple line contact; real-to-apparent contact area; space angles; surface roughness; Conformal mapping; Contact resistance; Current density; Electric resistance; Physics computing; Rough surfaces; Shape; Surface resistance; Surface roughness; Voltage;

fLanguage

English

Journal_Title

Components, Hybrids, and Manufacturing Technology, IEEE Transactions on

Publisher

ieee

ISSN

0148-6411

Type

jour

DOI

10.1109/33.16658

Filename

16658