Determination of current density distribution and constriction resistance in the multiple line contact with various space angles by using conformal mapping

The current-density distribution at the contact interface and the constriction resistance (or contact resistance in the contamination-free contact) of the multiple-line contact were calculated for various space angles by applying conformal mapping. This calculation is based on the fact that the potential to any point and the total current flowing through a contact interface are not changed by geometrical transformation. It is shown that the influence of the space angle on the current-density distribution shape at the contact interface is very great, and cannot be neglected in the prediction of the constriction resistance. However, in practice, the number of microcontacts and the ratio of real-to-apparent contact area associated with the surface roughness have only a negligible influence on the constriction resistance