DocumentCode :
1068064
Title :
Standardized terminology for oxide charges associated with thermally oxidized silicon
Author :
Deal, Bruce E.
Author_Institution :
Fairchild Camera and Instrument Corporation, Palo Alto, CA
Volume :
27
Issue :
3
fYear :
1980
fDate :
3/1/1980 12:00:00 AM
Firstpage :
606
Lastpage :
608
Abstract :
Standarized terminology for oxide charges associated with the thermally oxidized silicon system is presented. This terminology is recommended by a committee established by the Electronics Division of the Electrochemical Society and the IEEE Semiconductor Interface Specialists Conference. All engineers and scientists concerned with oxide charges in silicon semiconductor applications are urged to adopt this terminology.
Keywords :
Cameras; Instruments; Laboratories; MOSFETs; Meetings; NIST; Silicon; Societies; Telephony; Terminology;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1980.19908
Filename :
1480701
Link To Document :
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