• DocumentCode
    1068216
  • Title

    Impurities in silicon solar cells

  • Author

    Davis, John Ransford, Jr. ; Rohatgi, Ajeet ; Hopkins, Richard H. ; Blais, Phillip D. ; Rai-Choudhury, P. ; Mccormick, James R. ; Mollenkopf, H.C.

  • Author_Institution
    Westinghouse Research and Development Center, Pittsburgh, PA
  • Volume
    27
  • Issue
    4
  • fYear
    1980
  • fDate
    4/1/1980 12:00:00 AM
  • Firstpage
    677
  • Lastpage
    687
  • Abstract
    The effects of various metallic impurities, both singly and in combinations, on the performance of silicon solar cells have been studied. Czochralski crystals were grown with controlled additions of secondary impurities. The primary dopants were boron and phosphorus while the secondaires were: A1, B, C, Ca, Co, Cr, Cu, Fe, Mg, Mn, Mo, Nb, P, Pd, Ta, Ti, V, W, Zn, and Zr. Impurity concentrations ranged from 1010to 1017/cm3. Solar cells were made using a conventional diffusion process and were characterized by computer reduction of I-V data. The collected data indicated that impurity-induced performance loss was primarily due to reduction of the base diffusion length. Based on this observation, an analytic model was developed which predicts cell performance as a function of the secondary impurity concentrations. The calculated performance parameters are in good agreement with measured values except for Cu, Ni, and Fe, which at higher concentrations, degrade the cell substantially by means of junction mechanisms. This behavior can be distinguished from base diffusion length effects by careful analysis of the I-V data. The effects of impurities in n-base and p-base devices differ in degree but submit to the same modeling analysis. A comparison of calculated and measured performance for multiple impurities indicates a limited interaction between impurities, e.g., copper appears to improve titanium-doped cells.
  • Keywords
    Boron; Chromium; Copper; Crystals; Impurities; Iron; Niobium; Photovoltaic cells; Silicon; Zinc;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1980.19922
  • Filename
    1480715