Title :
The p- layer punch-through structure with a thick, high concentration p emitter for a light-triggered thyristor
Author :
Katoh, Shuji ; Yamazumi, Saigou ; Watanabe, Atsuo
Author_Institution :
Power Electron. Group, Hitachi Ltd., Ibaraki, Japan
fDate :
11/1/2002 12:00:00 AM
Abstract :
The on-state voltage reduction of a light-triggered thyristor was studied from the view-points of reducing the thyristor thickness and using a high-injection, low-lifetime structure. High-injection was achieved by increasing the thickness and concentration of the p emitter. The reduction in thyristor thickness was achieved by using a p- layer punch-through structure in both the p base and p emitter. This structure consists of a shallow, high-concentration p layer and a deep, low-concentration p layer. The depletion layer extends through the low-concentration p layer, and it reaches and is stopped by the high-concentration p layer when a high voltage is applied. This structure reduces the thickness by about 5%. The on-state voltage can be reduced for a 6-kV, 5.5-kA light-triggered thyristor by the p- layer punch-through structure and the thick, high-concentration region of the p emitter.
Keywords :
photothyristors; power semiconductor switches; semiconductor device measurement; semiconductor device models; semiconductor device testing; 5.5 kA; 6 kV; depletion layer; high-concentration p layer; light-triggered thyristor; low-concentration p layer; on-state voltage reduction; p base; p emitter; p- layer punch-through structure; Capacitance; Frequency conversion; HVDC transmission; Power semiconductor devices; Power transmission; Propagation losses; Snubbers; Thyristors; Valves; Voltage;
Journal_Title :
Power Electronics, IEEE Transactions on
DOI :
10.1109/TPEL.2002.805596