DocumentCode :
1068278
Title :
A comparison of majority- and minority-carrier silicon MIS solar cells
Author :
Ng, Kwok K. ; Card, Howard C.
Author_Institution :
Bell Laboratories, Murray Hill, NJ
Volume :
27
Issue :
4
fYear :
1980
fDate :
4/1/1980 12:00:00 AM
Firstpage :
716
Lastpage :
724
Abstract :
A systematic experimental investigation is reported of metal-SiO2-silicon (MIS) solar cells, as a function of SiO2thickness d , in the useful range 8 Å < d < 20 Å. Both majority-carder (Au-SiO2- nSi) and minority-carrier (Al-SiO2-pSi) structures are studied and their performance compared for SiO2layers prepared under identical oxidation conditions and with identical silicon surface treatments. The short-circuit current densities are observed to be suppressed by tunneling through the SiO2layers for d g\\sim 17 Å, whereas fill factors begin to decrease at even smaller values of d. The optimum effective AM1 conversion efficiencies for the majority-carrier cells are 9-10 percent for 10 Å ≲ d ≲ 14 Å, and for the minority-carrier cells are 11-12 percent for d \\simeq 10-11 Å. These results are in agreement with theoretical calculations, also presented here, which take account of both electrostatic and dynamic effects of interface states, and of their dependence on bias voltage and illumination.
Keywords :
Current density; Electrostatics; Interface states; Lighting; Oxidation; Photovoltaic cells; Silicon; Surface treatment; Tunneling; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1980.19927
Filename :
1480720
Link To Document :
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