Title :
Micromachined V-band CMOS bandpass filter with 2 dB insertion loss
Author :
Huang, Pi-Ling ; Chang, Jung-Fang ; Lin, Yu-Syuan ; Lu, Shey-Shi
Author_Institution :
Grad. Inst. of Electron. Eng. & Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei
Abstract :
A low-insertion-loss V-band CMOS bandpass filter is demonstrated. The proposed filter architecture has the following features: the low-frequency transmission-zero (omegaz1) and the high-frequency transmission-zero (omegaz2) can be tuned by the series-feedback capacitor Cs and the parallel-feedback capacitor Cp, respectively. To reduce the substrate loss, the CMOS process compatible backside inductively-coupled-plasma (ICP) deep trench technology is used to selectively remove the silicon underneath the filter. After the ICP etching, this filter achieved insertion loss (1/S 21) lower than 3 dB over the frequency range 52.5-76.8 GHz. The minimum insertion loss was 2 dB at 63.5 GHz, the best results reported for a V-band CMOS bandpass filter in the literature.
Keywords :
CMOS integrated circuits; MIMIC; band-pass filters; capacitors; circuit feedback; sputter etching; frequency 52.5 GHz to 76.8 GHz; frequency 63.5 GHz; high-frequency transmission-zero; inductively-coupled-plasma deep trench technology; loss 2 dB; low-frequency transmission-zero; low-insertion-loss V-band CMOS bandpass filter; parallel-feedback capacitor; series-feedback capacitor; substrate loss;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20092862