DocumentCode
1069276
Title
Integrated injection logic for VLSI
Author
Rofail, S.S. ; Elmasry, M.I. ; Heasell, E.L.
Author_Institution
Norwich University, Northfield, VT
Volume
27
Issue
7
fYear
1980
fDate
7/1/1980 12:00:00 AM
Firstpage
1301
Lastpage
1303
Abstract
This study shows that reducing the basewidth of I2L structures improves the intrinsic βui but improvements in the extrinsic βue and the delay times at low-current levels are less significant while high-current performance is degraded. Narrowing the epi region improves both βui and βue and the delay times at high currents, but degrades injection region efficiency λ, and delay times at low currents.
Keywords
Current density; Degradation; Delay; Doping; Impurities; Logic; Niobium; Substrates; Transient analysis; Very large scale integration;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1980.20026
Filename
1480819
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