• DocumentCode
    1069276
  • Title

    Integrated injection logic for VLSI

  • Author

    Rofail, S.S. ; Elmasry, M.I. ; Heasell, E.L.

  • Author_Institution
    Norwich University, Northfield, VT
  • Volume
    27
  • Issue
    7
  • fYear
    1980
  • fDate
    7/1/1980 12:00:00 AM
  • Firstpage
    1301
  • Lastpage
    1303
  • Abstract
    This study shows that reducing the basewidth of I2L structures improves the intrinsic βuibut improvements in the extrinsic βueand the delay times at low-current levels are less significant while high-current performance is degraded. Narrowing the epi region improves both βuiand βueand the delay times at high currents, but degrades injection region efficiency λ, and delay times at low currents.
  • Keywords
    Current density; Degradation; Delay; Doping; Impurities; Logic; Niobium; Substrates; Transient analysis; Very large scale integration;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1980.20026
  • Filename
    1480819