Title :
Integrated injection logic for VLSI
Author :
Rofail, S.S. ; Elmasry, M.I. ; Heasell, E.L.
Author_Institution :
Norwich University, Northfield, VT
fDate :
7/1/1980 12:00:00 AM
Abstract :
This study shows that reducing the basewidth of I2L structures improves the intrinsic βuibut improvements in the extrinsic βueand the delay times at low-current levels are less significant while high-current performance is degraded. Narrowing the epi region improves both βuiand βueand the delay times at high currents, but degrades injection region efficiency λ, and delay times at low currents.
Keywords :
Current density; Degradation; Delay; Doping; Impurities; Logic; Niobium; Substrates; Transient analysis; Very large scale integration;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1980.20026