DocumentCode :
1069276
Title :
Integrated injection logic for VLSI
Author :
Rofail, S.S. ; Elmasry, M.I. ; Heasell, E.L.
Author_Institution :
Norwich University, Northfield, VT
Volume :
27
Issue :
7
fYear :
1980
fDate :
7/1/1980 12:00:00 AM
Firstpage :
1301
Lastpage :
1303
Abstract :
This study shows that reducing the basewidth of I2L structures improves the intrinsic βuibut improvements in the extrinsic βueand the delay times at low-current levels are less significant while high-current performance is degraded. Narrowing the epi region improves both βuiand βueand the delay times at high currents, but degrades injection region efficiency λ, and delay times at low currents.
Keywords :
Current density; Degradation; Delay; Doping; Impurities; Logic; Niobium; Substrates; Transient analysis; Very large scale integration;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1980.20026
Filename :
1480819
Link To Document :
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