DocumentCode :
1069558
Title :
Development of a Transformable Plasma Device for Materials Processing
Author :
Ogata, Ken ; Terashima, Kazuo
Author_Institution :
Dept. of Adv. Mater. Sci., Univ. of Tokyo, Kashiwa
Volume :
37
Issue :
7
fYear :
2009
fDate :
7/1/2009 12:00:00 AM
Firstpage :
1203
Lastpage :
1207
Abstract :
In this paper, we have developed transformable-sheet electrodes for a capacitively coupled microwave plasma (CCMP) and diagnosed parameters of the CCMP in air, such as the rotational temperature of N2 (400-600 K at 80-230 torr) and the electron density (approximately 1013/cm3 at 300 torr). We applied the CCMP to surface modification of polycarbonate to improve the hydrophilic property of the surface. We also performed generation of a homogeneous plasma, which could be of various shapes, developing different transformable-sheet electrodes in air by ac (1.6 kV) at 10 kHz at 3 torr. These results suggested that on-demand plasma processing without an operating gas could be achieved by utilizing transformable-sheet electrode technology.
Keywords :
plasma devices; plasma materials processing; capacitively coupled microwave plasma; rotational temperature; sheet electrode; surface treatment; transformable plasma device; Flexible; microplasma; surface treatment; transformable;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2009.2021685
Filename :
5071304
Link To Document :
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