Title :
Magnetostriction in amorphous Gd2Fe14B thin films
Author :
Bushnell, S.E. ; Vittoria, C.
Author_Institution :
Dept. of Electr. & Comput. Eng., Northeastern Univ., Boston, MA, USA
fDate :
11/1/1993 12:00:00 AM
Abstract :
Films 222 nm thick were sputtered from a stoichiometric Gd2 Fe14B sintered target for the purpose of establishing their magnetoelastic properties. They were deposited onto precut rectangular coverglasses and Si substrates using ion beam sputtering. The saturation magnetostriction coefficient (λs), was measured using a ferromagnetic resonance (FMR) technique where the same specimen was characterized in the as-deposited state and after having been annealed at 300°C in gettered Ar for 30 min. The average values for (λs) were determined to be +19.9×10-6 and +34.6×10-6, respectively
Keywords :
amorphous state; annealing; boron alloys; ferromagnetic resonance; gadolinium alloys; iron alloys; magnetic thin films; magnetoelastic effects; magnetostriction; sputtered coatings; 300 degC; Si substrates; amorphous Gd2Fe14B thin films; ferromagnetic resonance; gettered Ar; ion beam sputtering; magnetoelastic properties; precut rectangular coverglasses; saturation magnetostriction coefficient; stoichiometric Gd2Fe14B sintered target; Amorphous materials; Annealing; Iron; Magnetic films; Magnetic resonance; Magnetostriction; Stress; Substrates; Transistors; Variable speed drives;
Journal_Title :
Magnetics, IEEE Transactions on
