DocumentCode :
1069924
Title :
MOS area sensor: Part II—Low-noise MOS area sensor with antiblooming photodiodes
Author :
Ohba, Shinya ; Nakai, Masaaki ; Ando, Haruhisa ; Hanamura, Shoji ; Shimada, Shigeru ; Satoh, Kazuhiro ; Takahashi, Kenji ; Kubo, Masaharu ; Fujita, Tsutomu
Author_Institution :
Central Research Laboratory, Hitachi Ltd., Tokyo, Japan
Volume :
27
Issue :
8
fYear :
1980
fDate :
8/1/1980 12:00:00 AM
Firstpage :
1682
Lastpage :
1687
Abstract :
The development of a high-sensitivity 320 × 244 element MOS area sensor and a novel fixed pattern noise (FPN) suppressing circuit are reported in this paper. The new device incorporates p+-n+high-C photodiodes and double-diffused sense lines. The p+-n+high- C photodiodes provide a large dynamic range and a large saturation signal of 1.4 µA with 6-1x W-lamp illumination. The double-diffused sense lines are introduced to vastly improve blooming characteristics, making use of a built-in potential barrier. FPN is proved to stem mainly from inversion charge variations through horizontal switching MOS gate capacitances. A simple high-performance FPN suppressing circuit is proposed which realizes high signal-to-noise ( S/N ) ratios of more than 68 dB at saturation. The new sensor is tested in a high-sensitivity black-and-white VTR hand-held camera and will find broad applications.
Keywords :
Cameras; Capacitance; Circuits; Dynamic range; Image sensors; Photodiodes; Sensor arrays; Sensor phenomena and characterization; Silicon compounds; Video recording;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1980.20088
Filename :
1480881
Link To Document :
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