Dependence of magnetostriction of sputtered Tb-Fe films on preparation conditions

Author

Hayashi, Y. ; Honda, T. ; Arai, K.I. ; Ishiyama, K. ; Yamaguchi, M.

Author_Institution

Res. Inst. of Electr. Commun., Tohoku Univ., Sendai, Japan

Volume

29

Issue

6

fYear

1993

fDate

11/1/1993 12:00:00 AM

Firstpage

3129

Lastpage

3131

Abstract

Amorphous Tb-Fe thin films prepared by the sputtering method in the compositional range Tb_xFe_1-x (x=0-0.5) are investigated in view of their potential for use in electromagnetic thin film actuators. The magnetostriction and the coercive force for the Tb-Fe films are examined for different sputtering conditions to obtain both soft magnetic properties and large magnetostriction in this system. As a result, Tb-Fe thin films having large magnetostrictions (180×10^-6 at 1 kOe) and low coercive force (60-70 Oe) are obtained. These films are prepared under the conditions of the composition of 45-50 at.% Tb, Ar gas pressure of 4 mTorr, RF input power of 200 W and using water cooled substrates. A trial actuator using magnetostrictive thin films is also reported

Keywords

amorphous state; coercive force; ferromagnetic properties of substances; iron alloys; magnetic properties of amorphous substances; magnetic thin films; magnetostriction; magnetostrictive devices; sputter deposition; sputtered coatings; terbium alloys; 200 W; 4 mtorr; Ar gas pressure; amorhous Tb-Fe thin films; coercive force; compositional range Tb_xFe_1-x; electromagnetic thin film actuators; magnetostriction; preparation conditions; radiofrequency input power; soft magnetic properties; sputtered Tb-Fe films; sputtering method; water cooled substrates; Actuators; Amorphous materials; Argon; Coercive force; Electromagnetic forces; Iron; Magnetic films; Magnetic properties; Magnetostriction; Sputtering;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.280877

Filename

280877