Magnetostriction of sputtered Sm-Fe thin films

Author

Honda, T. ; Hayashi, Y. ; Arai, K.I. ; Ishiyama, K. ; Yamaguchi, M.

Author_Institution

Tokin Corp., Sendai, Japan

Volume

29

Issue

6

fYear

1993

fDate

11/1/1993 12:00:00 AM

Firstpage

3126

Lastpage

3128

Abstract

The magnetostriction and the magnetic properties of amorphous Sm _xFe_100-x thin films prepared by sputtering are investigated at room temperature. The magnetostriction, -λ, of these films increases rapidly in low fields (<1 kOe) and reaches the maximum values of 300-400×10^-6 at 16 kOe for x=30-40. These results suggest that Sm-Fe thin films could be used for microactuators. The magnetic properties of Sm-Fe thin films do not show clear dependence on the sputtering conditions, such as input power, Ar gas pressure, and substrate temperature

Keywords

amorphous state; coercive force; ferromagnetic properties of substances; iron alloys; magnetic properties of amorphous substances; magnetic thin films; magnetostriction; samarium alloys; sputtered coatings; Ar gas pressure; amorphous Sm_xFe_100-x thin films; input power; magnetic properties; magnetostriction; microactuators; sputtered Sm-Fe thin films; sputtering conditions; substrate temperature; Amorphous magnetic materials; Amorphous materials; Magnetic anisotropy; Magnetic films; Magnetic properties; Magnetostriction; Perpendicular magnetic anisotropy; Saturation magnetization; Soft magnetic materials; Sputtering;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.280878

Filename

280878