Title :
Drain-Current Flicker Noise Modeling in nMOSFETs From a 14-nm FDSOI Technology
Author :
Ioannidis, Eleftherios G. ; Theodorou, Christoforos G. ; Karatsori, Theano A. ; Haendler, Sebastien ; Dimitriadis, Charalabos A. ; Ghibaudo, Gerard
Author_Institution :
Lab. d´Hyperfreq. et de Caracterisation, Inst. de Microelectron. Electromagn. et Photonique, Grenoble, France
Abstract :
Extensive investigation of the drain-current low-frequency noise in n-channel MOSFETs issued from a 14-nm fully depleted silicon-on-insulator technology node has been carried out. The results demonstrate that the carrier number fluctuation (CNF) with correlated mobility fluctuations (CMFs) model accurately and continuously describes the 1/f noise from weak to strong inversion, from linear to saturation, and for all the back-bias conditions. It is shown that using only two parameters, i.e., the effective flat-band voltage spectral density SVfb,eff and CMF factor Ωeff, the CNF/CMF noise model can predict the transistor 1/f noise level of all channel dimensions and under any bias conditions. Thus, it can be easily used in SPICE noise modeling for circuit simulations.
Keywords :
1/f noise; MOSFET; flicker noise; silicon-on-insulator; spectral analysis; transistors; CNF-CMF noise model; FDSOI technology; SPICE noise modeling; back-bias conditions; carrier number fluctuation; channel dimensions; circuit simulations; correlated mobility fluctuations; drain-current flicker noise modeling; effective flat-band voltage spectral density; fully depleted silicon-on-insulator technology node; low-frequency noise; n-channel MOSFET; nMOSFET; size 14 nm; transistor 1/f noise level; 1f noise; Logic gates; MOSFET; Mathematical model; Semiconductor device modeling; Low-frequency noise (LFN); UTBB fully depleted silicon-on-insulator (FDSOI) MOSFETs.;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2015.2411678